Simon Fraser University

Mask Aligner_Decomissioned


- micron-sized features with hard contact
- deep UV (254 nm) and near UV (365 nm) broadband source
- processing for small pieces, 50 and 100 mm wafers


Tool Status Down
Manufacturer Kasper
Typical Application Optical lithography
Location 6060.11
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Contact Information

Training

Grace Li li@4dlabs.ca