Simon Fraser University

Critical Point Dryer

The Critical Point Dryer is used to dry samples without the damaging effect of surface tension.  The basic operation of the CPD is as follows:

   1. Immerse sample in IPA in the chamber.

   2. Cool the chamber with liquid CO2.

   3. Fill chamber with liquid CO2.

   4. Continually replace IPA/CO2 mixture with pure liquid CO2.

   5. Heat the chamber past the critical point of CO2 (31 °C, 1072 psi).

   6. Vent the gaseous CO2.

   7. Remove the sample.

An entire process run takes ~1 hour and samples up to 4" wafers can be used in the tool.

Tool Status Up
Manufacturer Tousimis
Model Autosamdri-815B, Series B
Typical Application Drying MEMs samples
Location 6060.3
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Grace Li