Simon Fraser University

Tube Furnace 3 - Si3N4/SiNx


Ultra-low stress and stoichiometric silicon nitride LPCVD
Processing for 50 and 100 mm wafers


Tool Status Up
Manufacturer Tystar
Typical Application Nitride deposition
Location 6060.4
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Contact Information

Training

Hadi Esmaeilsabzali sabzali@4dlabs.ca