PVD 1
Thermal: 2 sources available, currently not occupied.
E-beam: Ni, Cr, Al, Ti
RF Sputter: Al2O3
DC Sputter: Ni, Al, Al/Si, Cr, Ti
- sources: 2 thermal, 4 e-beam, 2 DC sputter (1 source for ferromagnetic materials), 2 RF sputter
- 5E-7 Torr base pressure
- processing for small pieces, 50 and 100 mm wafers
| Tool Status | Up | ||
|---|---|---|---|
| Manufacturer | Bestec | ||
| Typical Application | Metal deposition | ||
| Location | 6060.8 | ||
| Related Documents | |||
| Contact Information |
Training
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