Simon Fraser University

PVD 6


Sputter: ZnO, Cr, ITO, Nb2O5

- sources: 3 sputter, DC and RF
- 5E-7 Torr base pressure
- processing for small pieces, 50 mm, 100 mm, and 150 mm wafers


Tool Status Up
Manufacturer Kurt J. Lesker
Model PVD75
Typical Application Oxide deposition
Location 6060.10
Contact Information

Training

Chris Balicki balicki@4dlabs.ca