Simon Fraser University

RIE 1


Etching of metals, nitrides, and III/V compounds with Cl2/BCl3
Etching of polysilicon and silicon with Cl2
Automated loading and unloading of wafers
Resist stripping or ashing with O2
Processing for small pieces, 50 and 100 mm wafers
Vacuum load lock with automated wafer loading

 


Tool Status Up
Manufacturer Sentech
Model SI 591
Typical Application Metal and III-V etching
Location 6060.6
Related Documents
Contact Information

Training

Hadi Esmaeilsabzali hesmaeil@sfu.ca