Simon Fraser University

Rapid Thermal Annealer 1


- temperature:
        range: Up to 1000 ºC
        ramp rate: 0.1 ºC/s to 200 ºC/s
- O2 and N2 gases
- 100 mm wafer chamber capability


Tool Status Down
Manufacturer AnnealSys
Model AS-One 100
Typical Application Thermal processing
Location 6060.6
Related Documents
Contact Information

Training

Mohamad Rezaei rezaei@4dlabs.ca