Simon Fraser University

Rapid Thermal Annealer 1

- temperature:
        range: Up to 1000 ºC
        ramp rate: 0.1 ºC/s to 200 ºC/s
- O2 and N2 gases
- 100 mm wafer chamber capability

Tool Status Up
Manufacturer AnnealSys
Model AS-One 100
Typical Application Thermal processing
Location 6060.6
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Contact Information


Kuan Zhang