Simon Fraser University


- spin-rinse and drying capability in one chamber
- double-stack chamber
- each SRD chamber is operated by its own programmable controller that accepts user recipe input
- includes resistivity monitor
- processing for 50 and 100 mm wafer cassettes

Tool Status Up
Manufacturer Semitool
Model 840S
Typical Application Rinsing and drying cassettes of wafers
Location 6060.5
Contact Information


Grace Li